Transparent conducting oxide films by atomic layer deposition for flexible electronics：Hf doped ZnO
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 97 === This study utilizes atomic layer deposition (ALD) to develop Hf:ZnO films for use as transparent conductive electrodes of flexible electronics. The conductivity of the ALD Hf:ZnO film was found to be limited by the layer-by-layer nature of the HfO2 and ZnO co...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/86625115931520257701 |