Abbe-PCA: Compact Abbe’s Kernel Generation for Microlithography Aerial Image Simulation using Principal Components Analysis
碩士 === 國立臺灣大學 === 電子工程學研究所 === 97 === The microlithography simulation is an important part of the VLSI manufacturing process. The aerial image atop the resist surface has long been used as a good first order approximation to the final etched features produced in microlithography. The fundamental ide...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/06591133927935725611 |