Materials and Diffusion Barrier Performance Analyses of TaNx Thin Films
碩士 === 國立臺灣科技大學 === 化學工程系 === 97 === Tantalum nitride (TaNx) thin films were deposited on silicon substrates by radio frequency (RF) reactive sputtering of Ta target in N2/Ar gas mixture. Experimental results indicated that the deposition rate, N/Ta ratio, resistivity and crystalline structure of Ta...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94207374215293200019 |