Si thin film deposition on SAM modified glass
碩士 === 國立臺灣科技大學 === 化學工程系 === 97 === Abstract This research is focused on the deposition of silicon thin film by plasma-enhanced chemical vapor deposition (PECVD) on the self-assembled monolayer (SAM) modified glass substrate. We study the morphology of the silicon thin film surface by AFM and SEM,...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/27935089528131448410 |