Magnetostriction of the ferromagnetic Fe81-XCoXGa19 thin films
碩士 === 國立臺灣科技大學 === 機械工程系 === 97 === In this research, we deposited Fe81-XCoXGa19 thin films on Corning 0211 glass substrate by sputtering, the arrangement of sample is glass (140μm)/ Fe81-XCoXGa19, X = 0、3、7、11、15、19(atomic percent). For each alloy target, there are two depositing conditions：1. as-...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79804825851224407387 |