Microwave Dielectric Properties Measurements of Thin Film by the Cavity Perturbation Technique
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 97 === A cavity perturbation method will be adopted in this research to measure the microwave complex permittivity of thin films. A X-band cavity fabricated by the standard WR-90 copper waveguide with length 13.5 cm was used for measurement. Thin films were deposit...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/t6unud |