Characterization and Fabrication of Thin Film Microcrystalline Silicon
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 97 === Abstruct This paper main research using Very High Frequency Plasma Enhanced Chemical Vapor Deposition development hydrogenate microcrystalline Si thin film optimization condition, applies in the solar cell the PIN three layer intrinsic absorbance layer t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/scj7su |