Photoelectrochemical properties of nitrogen-doped titanium dioxide thin films grown by atomic layer deposition
碩士 === 南台科技大學 === 光電工程系 === 97 === Photoelectrochemical properties of nitrogen-doped titanium dioxide thin films grown by atomic layer deposition Abstract In this study, N-doped titanium dioxide (TiO2) films were grown on n+-Si, Ti, Ni and Cu by atomic layer deposition at 300~500℃ with TiCl4 precurs...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10216056892840308312 |