The Transformation Quality Analysis of Layout Patterns in Nanoscale Lithography
碩士 === 南台科技大學 === 電子工程系 === 97 === When the chip size shrink, the exposure system on the linewidth of the feature size (Critical Dimension, CD) control is a challenge.Therefore, if the chip can improve the quality of imaging, it can improve the chip characteristics,such as a better mask or wafer yie...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93388500356652914080 |