Using Symmetric Film Stack to Enhance Surface Plasmon in the Kretschmann Configuration
碩士 === 國立臺北科技大學 === 光電工程系研究所 === 97 === This study is using the symmetric film stack to excite long range surface plasmon in the Kretschmann configuration and match admittance of metal with admittance of symmetric film stack. With deceasing thickness of deposited silver film, the micro structure i...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/r2mgrt |