Using Symmetric Film Stack to Enhance Surface Plasmon in the Kretschmann Configuration
碩士 === 國立臺北科技大學 === 光電工程系研究所 === 97 === This study is using the symmetric film stack to excite long range surface plasmon in the Kretschmann configuration and match admittance of metal with admittance of symmetric film stack. With deceasing thickness of deposited silver film, the micro structure i...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/r2mgrt |
| Summary: | 碩士 === 國立臺北科技大學 === 光電工程系研究所 === 97 === This study is using the symmetric film stack to excite long range surface plasmon in the Kretschmann configuration and match admittance of metal with admittance of symmetric film stack.
With deceasing thickness of deposited silver film, the micro structure is an island film. Therefore, the refractive index is different from that bulk silver. By using symmetric film stack matching method, the propagation length of long-range surface plasmon can be extended.
Optical admittance method can analyze the effect of the symmetric film stack on propagation length of surface plasmon. The half width of ATR curve is observed from the reflection angular spectrum. Our method offers the way to analyze the dependence of propagation length on different structures.
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