A study of nanoscale patterns fabricated on inorganic resist material by thermal lithography technique
碩士 === 元智大學 === 光電工程研究所 === 97 === A thermal lithography technique was proposed for fabricating nanoscale patterns. Due to heat of illuminating laser, the phase of a resist material can be altered from amorphous to crystalline states. The contrast of dissolution rate between these two states can con...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/86428527543451594121 |