Investigation of Low Temperature Atmospheric Pressure Plasma Deposited SiOx Thin Films
碩士 === 元智大學 === 化學工程與材料科學學系 === 97 === In this study, atmospheric pressure plasma chemical vapor deposition (APPCVD) technique was employed to deposit SiOx thin film on Polycarbonate (PC) substrates. We anticipate improving the surface properties of plastic substrates. Hexamethyldisilazane (HMDSN) a...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/96367815155339112756 |