於藍寶石基板上運用MOCVD成長氮化銦薄膜之磊晶研究

碩士 === 國防大學理工學院 === 光電工程碩士班 === 98 === In this study, indium nitride (InN) films have been grown on (0001)-oriented sapphire substrates by vertical reactor metal-organic chemical vapor deposition (MOCVD). Ammonia (NH3) and trimethylindium (TMIn) were employed as group-V and group-III precursors, re...

Full description

Bibliographic Details
Main Authors: Chang, Wei-Chun, 張偉昀
Other Authors: 桂平宇
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/50013560874763400798