On the Planarization Mechanism of Soft Pad Polishing: A Perspective from the Micro-Mechanical Property of Soft Pad

碩士 === 國立中正大學 === 機械工程所 === 98 === A soft pad has been used to polish high quality fine surfaces since ancient times. The drive for precision components and miniaturized devices in recent decade render the use of soft pad polishing necessary for a wide array of applications including precision machi...

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Bibliographic Details
Main Authors: Yu-Cheng Lin, 林育正
Other Authors: none
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/27314086986319219835