Modeling and Control of Wafer Temperature and Thickness in a LPCVD Furnace
碩士 === 長庚大學 === 化工與材料工程學系 === 98 === The chemical vapor deposition (CVD) is one of the thin film technologies extensively used in semiconductor manufacturing industries. There are many kinds of chemical vapor deposition furnaces. For improving film uniformity, it is important to keep uniform wafer t...
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| Format: | Others |
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2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02930842395349804309 |