RF Sputtering Nd2O3 Stacked High-k Dielectrics on the Polycrystalline Silicon
碩士 === 長庚大學 === 電子工程學系 === 98 === In this thesis, we added Ti and Ta to the Nd2O3 film to form new high-k dielectrics in place of traditional SiO2 insulator for applying in thin film transistor. The RF sputter was used to deposit these high-k materials and combine with post-RTA treatment to remo...
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| Format: | Others |
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2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/11251706183398542639 |