OES for the process monitoring of microwave plasma
碩士 === 長庚大學 === 機械工程研究所 === 98 === 英文摘要In this research, a real-time plasma diagnosis system of optical emission spectroscopy (OES) and Langmuir is developed to monitor the plasma of our microwave plasma enhanced chemical vapor deposition (MPECVD) system for probing the physical properties and chemi...
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| Format: | Others |
| Online Access: | http://ndltd.ncl.edu.tw/handle/30968893777299709531 |