Oxygen Plasma Ashing of Photo Spacer and It’s Spectral Analysis

碩士 === 中原大學 === 化學工程研究所 === 98 === This study aims to probe into the correlation between photoresist ashing rates and concentration of various active species in the plasma. variations in ashing rates were observed by manipulating different flow ratios and recipes of Photo Spacer (PS) made by photore...

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Bibliographic Details
Main Authors: Chi-Fa Liao, 廖啟發
Other Authors: Ta-Chin Wei
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/45616235043171742083