Gallium and Aluminum Co-doped Zinc Oxide (GAZO) Films Prepared by in-line Sputter Tool
碩士 === 崑山科技大學 === 電機工程研究所 === 98 === substrate unheated temperature, 100 °C, 200 °C and 250 °C. In-line sputtering is a popular method to produce large area, high throughput thin films in today industry. Optimum electrical and optical properties were obtained from GAZO films with 250 °C substrate te...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/40543260973395055275 |