Study of (100) oriented ZnO Films by Reactive RF Magnetron Sputtering
碩士 === 國立高雄應用科技大學 === 電子工程系 === 98 === In this experiment, the substrate is used by Corning-Glass, we deposited the ZnO films on the Corning-glass substrate by reactive RF magnetron sputtering method. Changing the conditions of Oxygen flow rate, chamber pressure, substrate temperature, RF power, tar...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44678708866339904558 |