Study of (100) oriented ZnO Films by Reactive RF Magnetron Sputtering

• Main Authors: Wen-Nan Jou, 周文南
• Other Authors: Maw-Shung Lee
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/44678708866339904558

碩士 === 國立高雄應用科技大學 === 電子工程系 === 98 === In this experiment, the substrate is used by Corning-Glass, we deposited the ZnO films on the Corning-glass substrate by reactive RF magnetron sputtering method. Changing the conditions of Oxygen flow rate, chamber pressure, substrate temperature, RF power, target-substrate distance, to find the sputtering parameters for (100) orientation ZnO films. The structures of the ZnO films were measured by x-ray diffraction (XRD), profile meter, Atomic Force Microscopy(AFM), UV-visible spectrophotometer(UV VIS) and Spectroscopic Ellipsometry(SE).Changing the parameters in this experiment, we successful deposited ZnO films with (100) oriented on the Corning-Glass substrate. Finally, we analyze the materials properties on the different ZnO films.