Hard Mask of Amorphous Carbon for Lithographic Application
碩士 === 明新科技大學 === 化學工程研究所 === 99 === As the CD patterning size scaled down to sub-100nm device node, the new technologies and materials such as etching hard mask and Anti-Reflective Coating (ARC) become more important. The manufacture of pattern definition by lithography and etching, the new materia...
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| Format: | Others |
| Language: | zh-TW |
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2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54570692206042033176 |