Measuring Stress of Thin Films with Stitch of White-light Interferometry
碩士 === 明新科技大學 === 電子工程研究所 === 98 === The stress in thin films is well known to be very important in all optical coating applications, because film stress produces several undesirable phenomena, such as the cracking or peeling of the film and the bending of the substrate. In this study, stress is mea...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/97681934960482818006 |