Fabrication and Characteristics Analysis of Zinc Oxide Transparent Thin Film Prepared by using Radio Frequency Magnetron Sputtering

碩士 === 明新科技大學 === 電子工程研究所 === 99 === This study used the home-made ceramic target to deposit ZnO thin films on the glass substrates by RF magnetron sputtering. By changing various process parameters including annealing temperature, Ar gas flow rate, substrate temperature, RF power, working pressure....

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Bibliographic Details
Main Authors: ZUO-MING, DAI, 戴佐明
Other Authors: Y. S. Lee
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/27398683676145396931