Silicon-Germanium thermoelectric thin films prepared by RF magnetron sputtering and their application on hydrogen gas sensing
碩士 === 國立中興大學 === 材料科學與工程學系所 === 98 === N-type Silicon-germanium thermoelectric thin films were prpeared on silicon substrates the by RF magnetron sputtering process. The sputtering target was a phosphorous-doped silicon target attached with germanium chips. The substrate temperature were rared room...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/85997843330926793451 |