The influence of ion-beam bombardment on Structures and Magnetic Properties of NiFe/NiO Bilayers

碩士 === 國立中興大學 === 材料科學與工程學系所 === 98 === Exchange bias in NiFe(9nm)/NiO(16nm) bilayers were investigated as a function of bottom NiO layers with dual ion beam bombarded by (1) different End-Hall voltage (0~150 V) for 5 minutes and (2) different periods (1~20 minutes) with VEH=150 V. And used differen...

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Bibliographic Details
Main Authors: Hsuan-Rong Huang, 黃宣榕
Other Authors: 林克偉
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/46832757385754692700