Characteristics of Al-doped ZnO films grown on (11-20) sapphire substrates using atomic layer deposition
碩士 === 國立中興大學 === 物理學系所 === 98 === Aluminum-doped zinc oxide (AZO) films were deposited on (11-20) sapphire substrates at 300°C by atomic layer deposition (ALD) using diethyl-zinc (DEZn),trimethyl-aluminum (TMAl) and nitrous oxide (N2O). The optical, structural and conductive properties of the ALD-g...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2010
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Online Access: | http://ndltd.ncl.edu.tw/handle/68301220973511470263 |