Preparation of polymeric resists and molds for micro/nano-imprinting lithography on flexible plastic substrates
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 98 === This thesis can be divided into five parts. First, a novel liquid photo-polymerization resist was prepared for nanoimprint lithography on transparent flexible plastic substrates. The resist is a mixture of poly(methyl methacrylate) (PMMA), methylmethacrylat...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36452344564938913697 |