The Study of Complementary Metal Oxide Semiconductor Failure Analysis in Nano Process
碩士 === 國立成功大學 === 電機工程學系專班 === 98 === The study of failure analysis (FA) is rare internal. Thus the purpose of this thesis is to setup a complete FA flow and to study the challenges of couple metal oxide semiconductor (CMOS) FA in nano process. First to study each technique of failure site local...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/98037867648443130145 |