The Study of HfO2 dielectric by CF4 plasma treatment for OTFT application
碩士 === 國立交通大學 === 電子工程系所 === 98 === The advantage of E-Gun Evaporation System is that we can control the process temperature to be under 200 ℃, and that is suitable for the application of flexible electronic process. The thin films are loose and defective if they are not annealing with high temperat...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02133172920667397324 |