A Study on Double Patterning Technique with i-line Stepper and Its Application to Device Fabrication
碩士 === 國立交通大學 === 電子工程系所 === 98 === In this thesis, we have developed a novel double patterning technique utilizing an i-line stepper for the formation of sub-100nm gate patterns and implemented this technique to the fabrication of devices. This technique consists of 2-step lithography and following...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13024971288582421311 |