Sampling of Inorganic Airborne Molecular Contaminants in Cleanrooms and Wafer Surface Deposition Characteristics
博士 === 國立交通大學 === 環境工程系所 === 98 === The deposition of inorganic airborne molecular contaminants (AMCs) on wafer surfaces will result in deterioration on device performance. In this study, three sampling devices which have been used in the cleanroom samling of AMCs are compared and optimal sampling c...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64943691811064668279 |