Development of Dielectrophoretic Lithography
碩士 === 國立交通大學 === 奈米科技研究所 === 98 === Because the lithography technique is progressing continuously, the dimension of transistor device is getting smaller. Recently, development of traditional optical lithography technique is reaching the limit, and it's not practical to have an advanced optical...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/86680491845025442508 |