Control of Crystalline Fraction of Hydrogenated Microcrystalline Silicon Films in Catalytic Chemical Vapor deposition
碩士 === 國立交通大學 === 顯示科技研究所 === 98 === The crystalline fraction is an important issue for the hydrogenated microcrystalline silicon (μc-Si:H) thin film solar cell. To keep crystalline fraction by catalytic chemical vapor deposition (Cat-CVD), we investigated the controlling of H2 dilution ratio in thi...
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| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41106159717486230080 |
| Summary: | 碩士 === 國立交通大學 === 顯示科技研究所 === 98 === The crystalline fraction is an important issue for the hydrogenated microcrystalline silicon (μc-Si:H) thin film solar cell. To keep crystalline fraction by catalytic chemical vapor deposition (Cat-CVD), we investigated the controlling of H2 dilution ratio in this study. In addition, the information on microcrystalline silicon bonding configuration was obtained by Fourier Transform Infrared Spectroscopy (FTIR) and we have used photo conductivity and dark conductivity to analyze hydrogenated microcrystalline silicon (μc-Si:H) thin film.
In addition, we have proceeded experiment about substrate temperature to deposit hydrogenated microcrystalline silicon thin film. And then we have discussed substrate effect probably influence our experiment, so we will use glass substrate、amorphous silicon / glass substrate and microcrystalline silicon / glass substrate to discuss in this study.
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