Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors

碩士 === 國立交通大學 === 顯示科技研究所 === 98 === The amorphous indium-gallium-zinc oxide (a-IGZO) channel thin-film transistor (TFTs) has high mobilites. However, the IGZO is not chemical stable in ambience; hence the passivation layer is essential for the devices long term stability. Thus the organic passivati...

Full description

Bibliographic Details
Main Authors: Wu, Chi-Shian, 吳耆賢
Other Authors: Shieh, Han-Ping
Format: Others
Language:en_US
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/93430471186036103031
id ndltd-TW-098NCTU5812128
record_format oai_dc
spelling ndltd-TW-098NCTU58121282016-04-18T04:21:38Z http://ndltd.ncl.edu.tw/handle/93430471186036103031 Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors 具功能性的有機薄膜封裝保護層在非晶態銦鎵鋅氧化物半導體薄膜電晶體之探討 Wu, Chi-Shian 吳耆賢 碩士 國立交通大學 顯示科技研究所 98 The amorphous indium-gallium-zinc oxide (a-IGZO) channel thin-film transistor (TFTs) has high mobilites. However, the IGZO is not chemical stable in ambience; hence the passivation layer is essential for the devices long term stability. Thus the organic passivation PTFMA and PMMA were proposed, due to their high material density (compare with other organic polymer) and hydrophobic feature. An a-IGZO with PTFMA shows a 2.3V threshold voltage (VTh) shift, another with PMMA shows VTh=6.4V shift, both devices revealed good stability in ambience; The sub-threshold swing (s.s.), VTh, and mobilities (μsat) changed only slightly. Finally, the functional color filter passivation layers were demonstrated, the colored passivation showed 49% National Television Systems Committee (NTSC) standard. In general, organic passivations provided a high potential passivation process for lowering deposition damage, functional color filter, printable, easy process, and lowering cost. These merits in organic passivation can also reduce the equipment and material costs. Shieh, Han-Ping 謝漢萍 2010 學位論文 ; thesis 60 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 顯示科技研究所 === 98 === The amorphous indium-gallium-zinc oxide (a-IGZO) channel thin-film transistor (TFTs) has high mobilites. However, the IGZO is not chemical stable in ambience; hence the passivation layer is essential for the devices long term stability. Thus the organic passivation PTFMA and PMMA were proposed, due to their high material density (compare with other organic polymer) and hydrophobic feature. An a-IGZO with PTFMA shows a 2.3V threshold voltage (VTh) shift, another with PMMA shows VTh=6.4V shift, both devices revealed good stability in ambience; The sub-threshold swing (s.s.), VTh, and mobilities (μsat) changed only slightly. Finally, the functional color filter passivation layers were demonstrated, the colored passivation showed 49% National Television Systems Committee (NTSC) standard. In general, organic passivations provided a high potential passivation process for lowering deposition damage, functional color filter, printable, easy process, and lowering cost. These merits in organic passivation can also reduce the equipment and material costs.
author2 Shieh, Han-Ping
author_facet Shieh, Han-Ping
Wu, Chi-Shian
吳耆賢
author Wu, Chi-Shian
吳耆賢
spellingShingle Wu, Chi-Shian
吳耆賢
Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors
author_sort Wu, Chi-Shian
title Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors
title_short Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors
title_full Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors
title_fullStr Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors
title_full_unstemmed Study in Functional Organic Passivation on amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors
title_sort study in functional organic passivation on amorphous-indium-gallium-zinc-oxide thin-film transistors
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/93430471186036103031
work_keys_str_mv AT wuchishian studyinfunctionalorganicpassivationonamorphousindiumgalliumzincoxidethinfilmtransistors
AT wúqíxián studyinfunctionalorganicpassivationonamorphousindiumgalliumzincoxidethinfilmtransistors
AT wuchishian jùgōngnéngxìngdeyǒujībáomófēngzhuāngbǎohùcéngzàifēijīngtàiyīnjiāxīnyǎnghuàwùbàndǎotǐbáomódiànjīngtǐzhītàntǎo
AT wúqíxián jùgōngnéngxìngdeyǒujībáomófēngzhuāngbǎohùcéngzàifēijīngtàiyīnjiāxīnyǎnghuàwùbàndǎotǐbáomódiànjīngtǐzhītàntǎo
_version_ 1718226986864738304