Investigation of plasma etching mechanism in DUV and TCO coatings
博士 === 國立中央大學 === 光電科學研究所 === 98 === In this research, the plasma etching mechanism has been applied to DUV and transparent conductive oxide coatings. For DUV coating, aluminum fluoride thin films have been deposited by plasma etching deposition with an aluminum target onto a room temperature substr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/62030654894757767094 |