Investigation of Hafnium Dioxide MIS Structure Prepared by RF Sputtering System and Its Application
碩士 === 南榮技術學院 === 工程科技研究所碩士班 === 98 === This study is the investigation of the optical and electrical properties of hafnium dioxide (HfO2) using MIS structure prepared by RF sputtering system. The excellent electric and optical properties of hafnium dioxide are useful for photodetectors. The samples...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/92750363658725265432 |