Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation
碩士 === 國立中山大學 === 材料與光電科學學系研究所 === 98 === The C54 TiSi2 thin films are widely applied in semiconductor devices due to the low electric resistance and high thermal stability. Through the annealing processing in this study, the metastable C49 TiSi2 with an electric resistivity of 219.3 μΩ-cm transform...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43652527498729042142 |