Semiconductor Assembly Manufacturing Industry Control of Volatile Organic Compounds by Wet Scrubbing and Advanced Oxidation Technology--Case Feasibility Studies of Full-Scale Plant--

• Main Authors: Shu-hung Yeh, 葉書宏
• Other Authors: lei Yang
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/67700774020785291383

碩士 === 國立中山大學 === 海洋環境及工程學系研究所 === 98 === Taiwan semiconductor manufacturing industry ranks top in the world for the production and has a great contribution to Taiwan economics. However, the industry produces a significant amount of volatile organic compounds (VOC) into the air. According to EPA of Taiwan, the annual VOC emission amounts from the industry were approximately five thousand tons, a major stationary source of VOC emission. The EPA has implemented the air pollution control regulation for semiconductor industry, in which the VOC emission amount should be below <0.6 kg/hr or the removal efficiency should be >90% for each factory . The conventional control technologies for the VOC emissions was concentration using zeolite followed by thermal oxidation. However, the high boiling points of VOC is difficult to desorbed from zeolite and it required the water to wash the zeolite. This would reduce the removal efficiency of zeolite. This control processes have high operation cost and may produce byproducts required for further treatment. Advanced chemical oxidation process (AOP) recently has gained tremendous attention as an emerging control technology of VOC due to low treatment cost and few oxidation byproducts. The major oxidant of the technology is believed to be hydroxyl radicals, which can react organic compounds at very reaction rates. A majority of VOC emissions from the semiconductor industry are highly soluble and can be easily dissolved into water by scrubbing process. However, the wet scrubbing process can produce a significant amount of wastewater. The objective of this study was to investigate the feasibility of using wet scrubber and O3/H2O2/catalyst process on controlling the VOC emissions from the semiconductor manufacturing industry. A full scale of process of 1000 CMM flowrate was designed and built along with a semiconductor packaging facility. Results showed that major compounds of the VOC exhaust were iso-propanol, PGMEA, PGME and methyl ethyl keton. The inlet concentrations of THC significantly varied from 50 to 600 ppmv as methane. The AOP process can removed 90-95% of VOCs and the scrubbing water can be recycled and reused at least 95%. The capital cost of the system was NT20,000,000 with the annual operation cost of NT120,000 which was only 36-40% of it for the concentration using zeolite followed by thermal oxidation.