The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor

碩士 === 國立清華大學 === 材料科學工程學系 === 98

Bibliographic Details
Main Author:	葉敬群
Other Authors:	戴念華
Format:	Others
Language:	zh-TW
Published:	2010
Online Access:	http://ndltd.ncl.edu.tw/handle/27096562511040428556

id	ndltd-TW-098NTHU5159021
record_format	oai_dc
spelling	ndltd-TW-098NTHU51590212016-04-25T04:27:13Z http://ndltd.ncl.edu.tw/handle/27096562511040428556 The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor 利用射頻電漿輔助化學氣相沈積法以四氯化矽為前驅物成長矽薄膜葉敬群碩士國立清華大學材料科學工程學系 98 戴念華李紫原 2010 學位論文 ; thesis 76 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立清華大學 === 材料科學工程學系 === 98
author2	戴念華
author_facet	戴念華葉敬群
author	葉敬群
spellingShingle	葉敬群 The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor
author_sort	葉敬群
title	The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor
title_short	The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor
title_full	The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor
title_fullStr	The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor
title_full_unstemmed	The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor
title_sort	deposition of silicon thin film by rf pe-cvd using silicon tetrachloride as precursor
publishDate	2010
url	http://ndltd.ncl.edu.tw/handle/27096562511040428556
work_keys_str_mv	AT yèjìngqún thedepositionofsiliconthinfilmbyrfpecvdusingsilicontetrachlorideasprecursor AT yèjìngqún lìyòngshèpíndiànjiāngfǔzhùhuàxuéqìxiāngchénjīfǎyǐsìlǜhuàxìwèiqiánqūwùchéngzhǎngxìbáomó AT yèjìngqún depositionofsiliconthinfilmbyrfpecvdusingsilicontetrachlorideasprecursor
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The deposition of silicon thin film by RF PE-CVD using silicon tetrachloride as precursor

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