The Growth of NiSi2 on Thin Substrates

碩士 === 國立清華大學 === 材料科學工程學系 === 98 === How to control the growth of epitaxial silicide has been an issue for many years. If we can control silicide islands to grow into the shape we want, the application of silicide may have breakthrough on many fields, such as optoelectronics industry and semico...

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Bibliographic Details
Main Authors: Feng, Erh-Kuo, 馮爾國
Other Authors: Tsai, Cho-Jen
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/42974354564540811057