Study on the resistive switching characteristics of atomic layer deposition HfO2 film with Ti interlayers
碩士 === 國立清華大學 === 材料科學工程學系 === 98
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52122409930456843756 |