Large area graphene prepared by high temperature FR-sputtering
碩士 === 國立清華大學 === 電子工程研究所 === 98 === Large-area uniform graphene is required for the development of graphene electronics. Until now, although large-area graphene films can be prepared by either chemical-vapor deposition or SiC substrate sublimation, the uniformity of the films is still unacceptable...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/59380190231955705659 |