Fabrication of high aspect ratio Fresnel zone plates by X-ray lithography
碩士 === 國立臺灣海洋大學 === 光電科學研究所 === 98 === Fresnel zone plates with 100 nm and 300 nm outmost linewidth has been fabricated by X-ray lithography. First, the masks with 1um thick gold were made by e-beam writer and electroplating deposition. Following, the dosages and photoresist development were optimiz...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15704451036766515821 |