Si Nanocrystal Embedded SiC MOS Light Emitting Diodes
碩士 === 國立臺灣大學 === 光電工程學研究所 === 98 === We demonstrate the deposition and characterization of silicon-rich and carbon-rich amorphous silicon carbide films by plasma-enhanced chemical vapor deposition (PECVD). The oxygen quantity reduces from 33.9 to 9.2% utilizing Ar purge to eliminate the residual o...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/22065256599008080331 |