Preparation and characterizations of Sputtered Amorphous HoScO3 Film on Pt and Cu-based Electrodes
碩士 === 國立臺灣科技大學 === 工程技術研究所 === 98 === 200-nm-thick HoScO3 films fabricated by magnetron sputtering on the Pt/Ti/SiO2/Si, Cu(ReNx)/Ti/SiO2/Si and Cu(RuN¬x)/TaN/SiO2/Si stack structures have been characterized. The effect of post-annealing on the microstructures and electrical properties are studied....
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2010
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/40034132969852795154 |