Fabrication of Photoresist Nanostructures on the Silicon Surface by E-beam lithography and Characterization of Adhesion Property

碩士 === 國立臺灣科技大學 === 高分子系 === 98 === In this study, nanostructures of photoresists were fabricated by e-beam lithography to investigate the surface property. The positive photoresist was used to fabricate square hole matrixes. The resolutions and duty ratios (hole width /hole spacing) of these square...

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Bibliographic Details
Main Authors: Jing-Hong Wang, 王景弘
Other Authors: Jem-Kun Chen
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/08876328151838368455