The Effect of Nitriding or Oxidizing on Properties of the TiCrZrNb Alloy Thin Film
碩士 === 中國文化大學 === 材料科學與奈米科技研究所 === 98 === In this study, Ti, Zr, Cr, Nb were selected to produce TiCrZrNb alloy target and deposited the thin films. The thin films were produced by the high vacuum DC sputtering process. Nitrogen or oxygen were used as the reactive gas to deposit the nitride or oxide...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/58656129402624651061 |