Atomic Layer Deposition of Nanostructured TiO2 Photocatalysts via Template Approach
碩士 === 南台科技大學 === 光電工程系 === 98 === In this study, titanium dioxide (TiO2) films were deposited on AAO templates by atomic layer deposition (ALD) at 300 °C with TiCl4 and H2O reactants. Ni nanocolumns were grown within the pores of those TiO2 coated AAO templates by electroplating, and then the AAO t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00826782290945983294 |